Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Yoshida, Hajime; Yokoyama, Kenji; Taniguchi, Masaki; Ezato, Koichiro; Suzuki, Satoshi; Akiba, Masato
Fusion Engineering and Design, 81(1-7), p.361 - 366, 2006/02
Times Cited Count：2 Percentile：17.18(Nuclear Science & Technology)A 100 V level, high-flux, large area and steady-state ion beam acceleration has been developed for the investigation of the interactions between fusion edge plasmas and plasma facing materials. We have developed the new electrodes and installed them in the Super Low Energy Ion Source (SLEIS). Obtained hydrogen ion flux is comparable to those of conventional high-flux ion source (
1020 H/m
s), though the accelerated voltage is extremely low (60-200 eV). This 100 V level ion beam acceleration will be useful to investigate the plasma wall interaction in divertor.
Iijima, Hokuto; Hajima, Ryoichi; Uesaka, Mitsuru*; Sakumi, Akira*; Sakamoto, Fumito*; Ueda, Toru*
Proceedings of 2nd Annual Meeting of Particle Accelerator Society of Japan and 30th Linear Accelerator Meeting in Japan, p.501 - 503, 2005/07
We report the availability of velocity bunching in an energy recovery linac (ERL) by a numerical analysis, and the plan of precise measurement of bunching emittance via a double-slit-scan method. The simulation performed for eight TESLA-type cavities reveals successful bunch compression from 3.2 ps to 0.17 ps. Since the residual energy spread after velocity bunching is considerably smaller than the correlated energy spread required for magnetic compression through a recirculation loop, velocity bunching is useful to realized short-pulse and high-brightness X-rays by ERL. The emittance of velocity bunching was calculated to be 1.5 
mm.mrad for the bunch charge of 77pC without the emittance compensation by an external solenoid field. Although the emittance growth due to the space-charge effect was small in the simulation, it is necessary to evaluate the emittance-growth mechanism under velocity bunching. Therefore, the emittance measurement via double-slit-scan method is carrying out in the UTNL-18L.
Iijima, Hokuto; Uesaka, Mitsuru*; Sakamoto, Fumito*; Ueda, Toru*; Kumagai, Noritaka*; Serafini, L.*
Japanese Journal of Applied Physics, Part 1, 44(7A), p.5249 - 5253, 2005/01
Times Cited Count：8 Percentile：32.18(Physics, Applied)We represent an experimental verification of a bunch compression method named "velocity bunching". The velocity bunching based on the rectilinear compression uses a traveling wave accelerating tube as a compressor. The experiment was performed by an S-band photoinjector and a linac at Nuclear Engineering Research Laboratory, University of Tokyo. The shot-by-shot bunch length was measured to be 0.5 
0.1 ps (rms) in average by the femtosecond streak camera for a bunch charge of 1 nC. The experimental result is in good agreement with PARMELA simulations.
Tanaka, Atsushi; Shimizu, Takashi*; Kikuchi, Masahiro; Kobayashi, Yasuhiko; Yamashita, Takao*; Watanabe, Hiroshi
JAERI-Conf 97-003, p.323 - 326, 1997/03
no abstracts in English
Asano, Yoshihiro; Sugita, Takeshi*
JAERI-Research 96-001, 164 Pages, 1996/01
JAERI-Research-96-001.pdf:5.03MB
no abstracts in English
*; Nakamura, Kazuyuki; Okumura, Yoshikazu; Shinto, Katsuhiro*
Dai-4-Kai Ryushisen No Sentanteki Oyo Gijutsu Ni Kansuru Shimpojiumu, p.19 - 22, 1993/00
no abstracts in English
; ;
J.Chem.Soc.,Faraday Trans.,I, 79, p.1973 - 1986, 1983/00
no abstracts in English
Tamada, Masao
no journal, ,
There are many products such as button batteries for watches, and radial tires applied by technology of radiation processing. These products were developed and commercialized by using features of radiation processing such as "modification of commercial product" and "homogeneous reaction in whole material" which cannot be realized by chemical processing. Low energy electron beam is available for the effective irradiation of nonwoven fabric owing to its high porosity. Graft polymerization produces the filter for removal of metal ions in silicon wafer cleaning liquid and cesium in tap water by using the nonwoven fabric as trunk polymers.
